2nd French-Japanese Workshop on Micro & Nanotechnology
第2回 マイクロ‐ナノテクノロジー技術に関する日仏ワークショップ
<English Page>




日時 2016年11月8日(火) 13:00~19:30
会場 京都大学吉田キャンパス 国際科学イノベーション棟 5階 シンポジウムホール
http://www.kyoto-u.ac.jp/ja/access/campus/yoshida/map6r_y/ ([69]の建物)
主催 文部科学省ナノテクノロジープラットフォームセンター
共催 ナノテクキャリアアップアライアンス事業
協賛 マイクロプロセス・ナノテクノロジー国際会議 (MNC2016)
日時 無料(ただし、ポスターセッション+立食バンケット参加は有料)
プログラム 13:00-13:05 Welcome
Ministry of Education, Culture, Sports, Science and Technology in Japan (MEXT)

Keynote Lecture
13:05-13:35 Keynote 1 – DNA as an Engineering Material to Bridge between MEMS and Nanotechnology
Osamu Tabata, Kyoto University

13:35-14:05 Keynote 2 – MEMS/MOEMS components for photonics: two approaches of integration of optical microsystems
Christophe Gorecki, Franche-Comté Electronique, Mécanique, Thermique et Optique – Sciences et Technologies (FEMTO-ST)

Introduction of User Facility Network in France and Japan
14:05-14:20 RENATECH, France
Michel de Labachelerie, RENATECH

14:20-14:35 Nanotechnology Platform, Japan
Tetsuji Noda, Center for Nanotechnology Platform, National Institute for Materials Science (NIMS)

14:35-15:00 Coffee Break

Technical Session
15:00-15:10 High resolution E-beam bi-layer paterning for photonic and nanoelectronic applications
Jean-René Coudevylle, l’instruction en famille (IEF)

15:10-15:20 Grayscale photolithography technique by using Maskless lithography system
Eiichiro Watanabe, University of Tsukuba

15:20-15:30 Patterning on various materials based on nanoimprint processes
Thierry Chevolleau, Laboratoire des Technologies de la Microélectronique (LTM)

15:30-15:40 Experimental fabrication of the Device for Biomolecules analysis using Zero Mode Waveguides
Eiji Omura, Kyoto University

15:40-15:50 NILUV-135, a resist that we formulated for NanoImprintLithography and that we use to make optical filters
Jean-Baptiste Doucet, Laboratoire d’Analyse et d’Architecture des Systèmes (LAAS)

15:50-16:00 Tohoku MEMS Integration and Packaging Platform in Tohoku University
Yukio Suzuki, Tohoku University

16:00-16:10 Machining of the lithium niobate material (LiNbO3) for Acoustics and Photonics
Gwenn Ulliac, Franche-Comté Electronique, Mécanique, Thermique et Optique – Sciences et Technologies (FEMTO-ST)

16:10-16:20 Reliable and short turnaround time SOI MEMS fabrication process for introductory courses
Lebrasseur Eric Charles, The University of Tokyo

16:20-16:30 Technological developments for the fabrication of advanced 3D micro-batteries
Dmitri Yarekha et Laurence Morgenroth, L’Institut d’électronique, de microélectronique et de nanotechnologie (l’IEMN)

16:30-16:40 In-situ Surface X-ray Diffractometer Equipped with Molecular Beam Epitaxy System
Seiji Fujikawa, National Institutes for Quantum and Radiological Science and Technology (QST)

16:40-16:50 Introduction to examples of the analysis using the photoelectron spectroscope
Tatsuya Murakami, Japan Advanced Institute of Science and Technology (JAIST)

Young Researcher’s Session
16:50-17:30 Short Presentations by Young Researchers

17:30-19:30 Poster Session and Reception
参加登録 参加登録期限:2016年10月31日(月)
お問合せ先 微細加工プラットフォーム・コーディネーター
TEL: 075-753-5656
Email: nanofab-coordinators(at)t.kyoto-u.ac.jp