2nd French-Japanese Workshop on Micro & Nanotechnology

 This workshop between French nanotechnology research network, RENATECH and Nanotechnology Platform Japan aims at information exchange and promotion of the collaboration among engineers working for user facilities. The workshop following the first workshop at Lyon last year, is held at Kyoto as a satellite event of 29th International Micro-processes and Nanotechnology Conference (MNC2016). In the workshop, new technologies supporting researches of micro and nanotechnology will be discussed through oral and poster presentations.
 The workshop is also held in cooperation with MicRO alliance workshop organized by three Universities (University of Michigan, Freiburg University and Kyoto University), co-supported by Nanotech Career up Alliance project and the Nanomics research division of Katsura Int’tech Center, Graduate School of Engineering, Kyoto University, and a poster session by young researchers and students will be arranged.


Date/time Tuesday Nov.8th 2016 / 13:00~19:30
Venue Kyoto Univ. Yoshida campus
International Innovation Center Symposium Hall
http://www.kyoto-u.ac.jp/en/access/yoshida/main.html (No.69 on the Map)
Sponsored by Nanotechnology Platform Center
Cooperation Nanotech Career up Alliance project
Nanomics research division of Katsura Int’tech Center, Graduate School of Engineering, Kyoto University
MicRO alliance workshop
29th International Microprocesses and Nanotechnology Conference(MNC2016)
Registration fee Free
Program 13:00-13:05 Welcome
Ministry of Education, Culture, Sports, Science and Technology in Japan (MEXT)

Keynote Lecture
13:05-13:35 Keynote 1 – DNA as an Engineering Material to Bridge between MEMS and Nanotechnology
Osamu Tabata, Kyoto University

13:35-14:05 Keynote 2 – MEMS/MOEMS components for photonics: two approaches of integration of optical microsystems
Christophe Gorecki, Franche-Comté Electronique, Mécanique, Thermique et Optique – Sciences et Technologies (FEMTO-ST)

Introduction of User Facility Network in France and Japan
14:05-14:20 RENATECH, France
Michel de Labachelerie, RENATECH

14:20-14:35 Nanotechnology Platform, Japan
Tetsuji Noda, Center for Nanotechnology Platform, National Institute for Materials Science (NIMS)

14:35-15:00 Coffee Break

Technical Session
15:00-15:10 High resolution E-beam bi-layer paterning for photonic and nanoelectronic applications
Jean-René Coudevylle, l’instruction en famille (IEF)

15:10-15:20 Grayscale photolithography technique by using Maskless lithography system
Eiichiro Watanabe, University of Tsukuba

15:20-15:30 Patterning on various materials based on nanoimprint processes
Thierry Chevolleau, Laboratoire des Technologies de la Microélectronique (LTM)

15:30-15:40 Experimental fabrication of the Device for Biomolecules analysis using Zero Mode Waveguides
Eiji Omura, Kyoto University

15:40-15:50 NILUV-135, a resist that we formulated for NanoImprintLithography and that we use to make optical filters
Jean-Baptiste Doucet, Laboratoire d’Analyse et d’Architecture des Systèmes (LAAS)

15:50-16:00 Tohoku MEMS Integration and Packaging Platform in Tohoku University
Yukio Suzuki, Tohoku University

16:00-16:10 Machining of the lithium niobate material (LiNbO3) for Acoustics and Photonics
Gwenn Ulliac, Franche-Comté Electronique, Mécanique, Thermique et Optique – Sciences et Technologies (FEMTO-ST)

16:10-16:20 Reliable and short turnaround time SOI MEMS fabrication process for introductory courses
Lebrasseur Eric Charles, The University of Tokyo

16:20-16:30 Technological developments for the fabrication of advanced 3D micro-batteries
Dmitri Yarekha et Laurence Morgenroth, L’Institut d’électronique, de microélectronique et de nanotechnologie (l’IEMN)

16:30-16:40 In-situ Surface X-ray Diffractometer Equipped with Molecular Beam Epitaxy System
Seiji Fujikawa, National Institutes for Quantum and Radiological Science and Technology (QST)

16:40-16:50 Introduction to examples of the analysis using the photoelectron spectroscope
Tatsuya Murakami, Japan Advanced Institute of Science and Technology (JAIST)

Young Researcher’s Session
16:50-17:30 Short Presentations by Young Researchers

17:30-19:30 Poster Session and Reception
Registration Guideline Online registration dead line : End of October
contact Nanofabrication Platform・Coordinators
TEL: +81-75-753-5656
Email: nanofab-coordinators@t.kyoto-u.ac.jp