This workshop between French nanotechnology research network, RENATECH and Nanotechnology Platform Japan aims at information exchange and promotion of the collaboration among engineers working for user facilities. The workshop following the first workshop at Lyon last year, is held at Kyoto as a satellite event of 29th International Micro-processes and Nanotechnology Conference (MNC2016). In the workshop, new technologies supporting researches of micro and nanotechnology will be discussed through oral and poster presentations.
The workshop is also held in cooperation with MicRO alliance workshop organized by three Universities (University of Michigan, Freiburg University and Kyoto University), co-supported by Nanotech Career up Alliance project and the Nanomics research division of Katsura Int’tech Center, Graduate School of Engineering, Kyoto University, and a poster session by young researchers and students will be arranged.
Overview
| Date/time | Tuesday Nov.8th 2016 / 13:00～19:30 |
|---|---|
| Venue |
Kyoto Univ. Yoshida campus International Innovation Center Symposium Hall http://www.kyoto-u.ac.jp/en/access/yoshida/main.html (No.69 on the Map) |
| Sponsored by | Nanotechnology Platform Center |
| Cooperation |
Nanotech Career up Alliance project Nanomics research division of Katsura Int’tech Center, Graduate School of Engineering, Kyoto University MicRO alliance workshop 29th International Microprocesses and Nanotechnology Conference(MNC2016) |
| Registration fee | Free |
| Program |
13:00-13:05 Welcome Ministry of Education, Culture, Sports, Science and Technology in Japan (MEXT) Keynote Lecture 13:05-13:35 Keynote 1 – DNA as an Engineering Material to Bridge between MEMS and Nanotechnology Osamu Tabata, Kyoto University 13:35-14:05 Keynote 2 – MEMS/MOEMS components for photonics: two approaches of integration of optical microsystems Christophe Gorecki, Franche-Comté Electronique, Mécanique, Thermique et Optique – Sciences et Technologies (FEMTO-ST) Introduction of User Facility Network in France and Japan 14:05-14:20 RENATECH, France Michel de Labachelerie, RENATECH 14:20-14:35 Nanotechnology Platform, Japan Tetsuji Noda, Center for Nanotechnology Platform, National Institute for Materials Science (NIMS) 14:35-15:00 Coffee Break Technical Session 15:00-15:10 High resolution E-beam bi-layer paterning for photonic and nanoelectronic applications Jean-René Coudevylle, l’instruction en famille (IEF) 15:10-15:20 Grayscale photolithography technique by using Maskless lithography system Eiichiro Watanabe, University of Tsukuba 15:20-15:30 Patterning on various materials based on nanoimprint processes Thierry Chevolleau, Laboratoire des Technologies de la Microélectronique (LTM) 15:30-15:40 Experimental fabrication of the Device for Biomolecules analysis using Zero Mode Waveguides Eiji Omura, Kyoto University 15:40-15:50 NILUV-135, a resist that we formulated for NanoImprintLithography and that we use to make optical filters Jean-Baptiste Doucet, Laboratoire d’Analyse et d’Architecture des Systèmes (LAAS) 15:50-16:00 Tohoku MEMS Integration and Packaging Platform in Tohoku University Yukio Suzuki, Tohoku University 16:00-16:10 Machining of the lithium niobate material (LiNbO3) for Acoustics and Photonics Gwenn Ulliac, Franche-Comté Electronique, Mécanique, Thermique et Optique – Sciences et Technologies (FEMTO-ST) 16:10-16:20 Reliable and short turnaround time SOI MEMS fabrication process for introductory courses Lebrasseur Eric Charles, The University of Tokyo 16:20-16:30 Technological developments for the fabrication of advanced 3D micro-batteries Dmitri Yarekha et Laurence Morgenroth, L’Institut d’électronique, de microélectronique et de nanotechnologie (l’IEMN) 16:30-16:40 In-situ Surface X-ray Diffractometer Equipped with Molecular Beam Epitaxy System Seiji Fujikawa, National Institutes for Quantum and Radiological Science and Technology (QST) 16:40-16:50 Introduction to examples of the analysis using the photoelectron spectroscope Tatsuya Murakami, Japan Advanced Institute of Science and Technology (JAIST) Young Researcher’s Session 16:50-17:30 Short Presentations by Young Researchers 17:30-19:30 Poster Session and Reception |
| Registration Guideline |
Online registration dead line : End of October
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| contact |
Nanofabrication Platform・Coordinators TEL: +81-75-753-5656 Email: nanofab-coordinators＠t.kyoto-u.ac.jp |